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Ohara Sk-1300 Fused Silica Glass

Product Item : RT20220511001#
Category： Materials
Type: Ohara Optical Substrate
Substrate: Ohara Sk-1300 Fused Silica
Bubbles: 0-0.03mm2/100cm3
Striae: Grade a in One Direction(as Per Mil-G-174)
Product description：Ohara Sk-1300 Fused Silica Glass/Ohara Fused Silica Glass/Ohara Sk-1300 Optical Glass/Ohara Quartz
INQUIRY

General Introduction: The VAD-process synthetic fused silica CFS-100 as a result of significant improvements made to the conventional VAD(Vapor-phase axial deposition) method of optica fiber manufacturing technology, developed by OHARA,Japan.
OHARA CFS-1300 is extremely high in purity and much lower in OH content than the traditional direct method, thus making it the first synthetic fused silica usable in the semiconductor and liquid crystal display industries.
OHARA CFS-100 is the state-of-art technology in optical characteristics because it provides a high ultraviolet transmission, no micro inclusion and a solarization resistance, in addition to heat resistance, mechanical strength, and chemical resistance.

Products Name: OHARA SK-1300 Fused Silica Glass
Alias:OHARA SK-1300 glass, Ohara sk-1300 fused silica, Ohara Sk-1300, Ohara sk-1300 VAD fused silica, Ohara SK-1300 synthetic fused silica, Ohara SK-1300 optical glass, etc

Chemical Resistance:

Solution	Treatment Temperature(ºC)	Treatment Time(H)	Test Results
H20	95	45	0.0001-0.0002
1/100 NHNO3	115	20	0.005-0.01
5% NaOH	100	10	1.35

Optical Qualities:

Item	Grade
Bubbles	0-0.03mm2/100cm3
Striae	Grade A in one direction(As per Mil-G-174)
Birefrengence(Strain)	10nm/cm and under
Fluorescence	Not permitted(Excited wavelength 254nm)

Physical Properties:

Item	Unit	Value
Density	g/cm3	2.201
Yong's Module	Kg/mm2	7280
Poisson's ratio		0.17
Compression strength	Kg/mm2	115
Bending strength	Kg/mm2	7.0
Tensile strength	Kg/mm2	5.6
Torsional rigidity	Kg/mm2	3150
Vickers hardness	Kg/mm2	900-1030
Knoop hardness	Kg/mm2	650-710
Coefficient of thermal expansion	cm/cmºC	5.5*10-7
Softening point	ºC	1700
Annealing point	ºC	1160
Strain point	ºC	1060
Specific heat(26ºC)	Cal/g.ºC	0.176
Thermal conductivity ratio(26ºC)	cal/cm.sec.ºC	2.65*10-3
Thermal conductivity ratio(100ºC)	Cal/cm.sec.ºC	3.27*10-3

Main Applying Fields:

Applying Fields:

This product can be used in a wide variety of industrial applications for semiconductors, optical and all physical or chemical related research featuring these applications:
1).Wafers for various types of devices such as TFT(poly-Si thin-film transistor LCD.),SOI(Silicon on Insulator) etc.
2).Photomask substrates for ultra-LSI and LCD.
3). Reactor furnace tubes, jigs and tools for ULSI manufacturing processes.
4). Electrical-discharge lamp tubes.
5).Optical elements, Lenses, mirrors and windows, for ultraviolet and vacuum ultraviolet.

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Matching Custom Manufacturing Serivce:
Including Moulding, CNC machining, Polishing, Particle beam processing, Magnetic flux conversion processing, Grinding, Coating, Lightweighting, Custom Shaping, Counterbores, Drilling & Coring, Edge & Bevel Polishing,3D Contouring, Bevels & Chamfers, Steps & Slots, Laser Cutting & Marking, Metrology & Inspection, Precision Pitch Polishing, Double-Sided Polishing, Optical Assembly, Measuring, etc.
Matching processing equipments;
1).Single side lapping and polishing machines
2).Duble sided polishing machines
3).Ring throwing machines
4).DMG five-axis five-linkage spherical milling machine
5).DMG ultrasonic machining center
6).Super large scale gantry cnc machining center (2.0*2.0m)
7).Super large scale surface grinder (1.6m*1.6m)
8).CNC cutting machines
9).Thin plate cleaning machines
10).Ultrasonic trough cleaning machines
11).Plane interferometers
12).Two dimensional detectors
13).Ion beam polishing machines
14).Magnetorheological polishing equipments

Main Cooperation Materials Manufacturers:

CORNING, OHARA, SCHOTT, LEONI, AGC,HELLMA, NIKON,VITRON,C-LASER,ETC

Main Export Countries & Areas:
Usa, Uk, Japan, Germany, Spain, France, Swiss, Korea, Russia, Pakistan, India, Portugal, Canada, New Zealand, Australia, Saudi Arab, Turkey, Finland, Poland ,etc.

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